White Paper Author D. J. Harra Varian Vacuum Division Palo Alto, California VR-93 Abstract The need for higher production capacity, reliability and improved cleanliness within the semiconductor and other industries has led to many vacuum system designs. The dependence of vacuum cleanliness on various design considerations in addition to unintentional contamination during normal system use makes cleanliness a difficult parameter to characterize. Recent advances are described which improve the capabilities of sputter-ion pump systems for ultra-clean, high production applications. Performance characteristics of demountable titanium sublimation pumps, which permit fast and efficient removal of the accumulated titanium compounds, are reviewed. Improvements in the technology of titaniu

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