White Paper Introduction Agilent ICP-MS systems are widely used for accurate low-level analysis of trace contaminants across a wide range of high-purity chemicals used in the semiconductor industry. The first commercial ICP-MS to offer reliable, routine cool plasma operation was the Agilent 4500, launched in 1994. This instrument enabled low-level analysis of previously problematic elements Na, K, Ca, and Fe, allowing semiconductor laboratories to expand their capabilities in metals analysis from GFAAS to ICP-MS. Building on the success of the 4500, Agilent introduced further innovations in the 7500s, 7500cs, and 7700s models, providing more sensitivity, stability, and matrix tolerance. Working closely with semiconductor manufacturers and suppliers, Agilent has continually develo

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