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g or e. c om/filt er s Situation A manufacturer of silicon-on-insulator wafers was experiencing difficulties with the performance of a new DI loop. They tried five filters from four manufacturers, and none of them rinsed up to meet particle specification with an acceptable time period. The best candidate 0.1 µm filter met particle specification only after 30 days. The system comprised two polish loops: a DI loop and a UPW loop. • DI loop:

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