Statement of Problem For semiconductor wafer processing, the level of tetramethylammonium hydroxide in water is very critical in the developer blend system. The solution of tetrameth- ylammonium hydroxide must be kept at 2.38%. Summary of Conclusions The concentrations of tetramethylammo- nium hydroxide can be easily measured at 2.38% by near-infrared (NIR) spec- troscopy with a ? ber optic coupled NIR Model 412 Process Analyzer to better

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