Case Study
Temperature Measurement During Epitaxial Deposition
RevA/June 2012 www.raytek.com KEY FACTS Industry Semiconductor Customer’s End Product Silicon wafers Process Temperatures 300-1300°C/572-2372°F Distance to Object VF1 optics (400mm to 1050mm/15.7” to 41.3” mounting distance) How do you monitor the temperature of a silicon wafer accurately without background temperature affecting the measurement? Situation and background Many processes involve heatin