ISO 9001 Certified | (520) 290-6060 | Fax (520) 290-0109 | AlicatScientific.com INNOVATIVE FLOW & PRESSURE SOLUTIONS | PRODUCT & TECHNICAL GUIDE Sputtering Flow Control In the process of sputtering, a plasma gas (typically argon) is used to fill a vacuum chamber which contains a target lattice and a substrate. The amount of plasma gas within the chamber is critical to control of the number of atoms released from

Join for free to read