Case Study

Removing Dissolved Oxygen From Ultrapure Water

Removing Dissolved Oxygen From Ultrapure Water

Pages 2 Pages

Removing Dissolved Oxygen From Ultrapure Water Membrane Contactor system reduces dissolved oxygen concentration to 10 ppb. T he increasing complexity and level of integration in ULSI devices is requiring higher levels of water purity. A typical wafer uses between 20 to 200 separate rinsing steps. Impurities in the rinse water such as particles, high dissolved oxygen content, organic con- taminants and gas bubbles can cause defects. Controlling ox

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