Precision Photonics Stage (SSMI-07) | Celera Motion Precision Photonics Stage (SSMI-07) The constant advancement of semiconductor technology and shrinking size of wafer features, drives wafer metrology equipment to ever-increasing levels of precision motion control to ensure the optical system components meet these demanding performance requirements. Runout in the two axes perpendicular to the axis of motion, roundness of drilled holes, and the dynamics during and at the end of motion are especially critical. Low and consistent friction and optimal move and settle performance is required. Designing and manufacturing mechatronics assemblies that reliably achieve this level of performance requires a trusted precision motion partner with advanced mechatronics expertise, high performance mo

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