Point of Use Dilution APPLICATION A semiconductor production facility has numerous chemical mechanical planarization (CMP) tools. At various times during the CMP process, fluids are delivered to the wafer for polishing or rinsing using a pressurized chemical system. During the rinse phase a chemical (acid or ammonia) is diluted 40:1 with deionized water*. MCMILLAN PRODUCTS UTILIZED U801 Liquid Flo-Controllers DESCRIPTION McMillan Liquid Flo-Controllers combine smart electronics with a precision control valve and flow sensor. The output from the flow sensor is analyzed and compared to the flow rate set point. The control valve is then automatically adjusted to achieve the required flow. OPERATION Deionized water and the chemical are mixed downst

Join for free to read