Capacitively Coupled Plasma Analysis
Capacitively Coupled Plasma Analysis
1 PagesC OMSOL NE WS 2 0 1 1 // 5 MULTIPHYSICS ALTASIM TECHNOLOGIES, COLUMBUS, OHIO Capacitively Coupled Plasma Analysis Multiphysics simulations can be used to assist with the development of new CCP processing technology. ALTASIM TECHNOLOGIES, COLUMBUS, OHIO P lasmas consist of electrons, ions, and neutral species interacting with each other and with externally imposed elec- tromagnetic fields. Plasma etching and deposition of thin films are criti
