The requirements for lithography systems are very stringent: They are supposed to quickly, reproducibly and cost-effectively produce large quantities of high-pre- cision masks with sizes up to 4 m 2 . A key requirement is the positioning accura- cy of the laser beam. This is based on a low-vibration machine frame with high- precision geometry, robust and fast automation technology and exact measured value compensation. Tobias Reiter, managing dir

Join for free to read